13.10/2023
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Molybdenum sputtering targets
Application:
Sputtering targets made from high-grade molybdenum are used in physical vacuum deposition technologies (PVD methods) for thin films and functional coatings in the production of solar battaries and integral circuits, in forming TFT-matrices of large-format LCD displays, and in other technical spheres.
Guaranteed chemical composition of molybdenum products for sputtering targets
| Brand | Мо, %* | Admixtures, ppm, maximum | |||||||
| Fe | Al | Ni | Si | C | O | N | ∑Me** | ||
| Mo99.95-PM | >99,95 | 100 | 50 | 50 | 100 | 100 | 70 | 50 | <500 |
* Typical content of the base element Мо 99.97%
** Sum of metallic admixtures
Product shape
Sheets, discs, and rings, tooled in accordance with the product design.
Sheet dimensions
- Thickness from 5 to 32 mm;
- width up to 550 mm;
- length up to 1500 mm.
Targets can be produced in the form of a set of end-joined parts of any width and any total set length.
Allowances for dimensions and roughness are established based on the client's requests.
