13.10/2023
POLEMA presented at the“BIOTECHMED” its innovative medical products
11.07/2023
POLEMA at INNOPROM in Ekaterinburg
03.06/2011
Progressive materials for multi-functional vacuum coatings
Application fields of materials for multi-functional vacuum coatings, characteristics of sputtering targets and evaporable sources used for technologies of physical deposition of hardening, protective, decorative and light-reflecting coatings, resistive, switching and transparent electro conductive films.
24.05/2011
Molybdenum and tungsten products for production of leucosapphires
POLEMA JSC is the leading global manufacturer of chromium, molybdenum, tungsten products, metal powders and composite materials.
Sputtering Ni, NiCr targets and evaporable Ni, NiCr cathodes
Field of use
Mechanical engineering, electronics. Protective coatings on machine and equipment parts.
Shape
- Simple-shape products, with rectangular or round cuts, in the form of sheets, plates, rods and discs.
- Complex-shape products (cathodes) cut according to the client's drawings.
The shape, dimensions, permissible deviations for product size and the tooling precision are determined by the client's request.
Chemical composition
Products of the grade N1-PM (Ni-PM) are produced at the client's request, products of the grades NP1, NP2 can be produced according to State Standard 492-2006.
Guaranteed purity of the material is at least 99.9 % of Ni with minimal content of harmful impurities.
The chemical composition of products is ensured to be no lower than the requirements for nickel powders of the group U under State Standard 9722-97.
Guaranteed chemical composition of N1-PM (Ni-PM) grade nickel
| Grade | Ni | C | Fe | Co | Si | Cu | Mg | As | S | Zn | P | Cd | Bi | Mn | Sn | Pb | Sb | Ca |
| ppm, maximum | ||||||||||||||||||
| N1-PM (Ni-PM) |
99.9% min |
0.09% max |
15 | 10 | 10 | 3 | 3 | 5 | 7 | 3 | 3 | 1 | 1 | 3 | 1 | 1 | 2 | 50 |
PM – Powder Metallurgy
Products are made using powder metallurgy. The density of deformed (hot-rolled and forged) products is at least 99% of the theoretical value. There are no internal pores or open porosity in the structure of the material of these sputtering targets and evaporable cathodes.
Sputtering NiCr targets
Guaranteed chemical composition
| Grade |
Ni+Cr, wt%, not less |
Cr, % | Impurities, mkg/g ppm, maximum | |||||||||
| Fe | Al | Si | Cu | Ca | Mn | S | C | O | N | |||
| Ni/Cr 80/20 99.9 wt% | 99.90 | 20±1.5 | 500 | 100 | 100 | 50 | 50 | 200 | 100 | 200 | 500 | 100 |
Amount of metal impurities:
Ni/Cr 80/20 99.9 wt%– not more than 1000 mkg/g
Advantages
- a rather high chemical purity;
- a high density and homogeneous microstructure of the items material, providing a process stability of targets sputtering or arc evaporation of cathodes;
- a various range of the items, designed in accordance with the customer’s requirements.
